Mask-less Laser Lithography
JOANNEUM RESEARCH Forschungsgesellschaft mbH
[REPLICATION] master scale-up [OTHER] Other
Lighting Optical instrumentation

Origination by mask-less Laser Lithography

Our unique mask-less laser lithography enables the low-cost production
of novel and complex high-resolution sub-micro and micro-structures: 

  • Master fabrication e.g. for UV-nanoimprint lithography, hot-embossing, high precision optical injection moulding, vacuum resin casting
  • a Rapid prototyping in Micro-Optics, Photonics, Microfluidics, Electronics and others

Several advantages can be realised:

  • Reduction of process time
  • digital, non-photomask-based production
  • quick and flexible to test and implement design changes
  • fabrication of microstructures on flat and curved substrates via 5-axes nano-positioning system

Applications can be found in

  • Free form micro optics for innovative illumination designs
  • Diffractive and refractive micro optical elements
  • Bionic surfaces in aviation for reduction of drag to reduce fuel consumption
  • Microfluidic Lab-on-Chip systems for molecular diagnostics
  • Micro-Electronics
  • High quality fabrication of sub-micro and micro-structures on large area formats (2", 4", possibly 6" substrate)
  • Structures can have a 1D, 2D, or stepless (2.5 D) relief shape
  • Minimum structure size achieved in the lateral direction of our system is in the range of 200 nm
  • Maximum structure depth for 2.5D microstructures is in the range of 60 μm
  • Aspect ratio of 4 is possible
  • Depending on the complexity of the designed microstructure, the processing time is approx. 1 hour per cm2