Nanostructuring via plasma processes
We provide feasibility studies, samples for tests, pilot production, technology and licences transfer and modification on existing coating plants.
TECHNICAL SERVICE
Fraunhofer FEP
R2R R2P Wafer-scale
[LAYER DEPOSITION] Magnetron Sputtering [LAYER DEPOSITION] Other [OPTICAL ELEMENTS] dry etching
Automotive Decoration & Luxury Imagers & Displays Lighting Solar, Energy & Daylight Other

The Fraunhofer FEP, together with the Fraunhofer IOF and industrial partners, has developed a method for making polymer films anti-reflective in an efficient roll-to-roll process. By using plasma-etching in vacuum equipment anti-reflective properties can be applied to polymer films in a more efficient way than with any other currently available process. The process is ideal for very thin polymer films, where the application of a multilayer anti-reflective layer system would adversely affect the film flexibility. Even curved substrates can be uniformly treated using this process.

The Fraunhofer FEP uses dual magnetron systems, which are normally used for coating, as plasma sources for a process which is stable over several hours in order to effectively render polymer films anti-reflective

Offering:

  • feasibility studies
  • samples for tests and pilot production
  • technology and license transfer and modification of existing coating plant
  • roll-to-roll plasma-etching
  • sheet-to-sheet-plasma etching
  • treatment speed: 0.5 m/min (per station, up to 6 process stations available)
  • plasma sources: Dual magnetron systems
  • treatment width: 600 mm
  • residual reflectivity: 0.2 percent per anti-reflective side
  • low dependence on the angle of observation
  • Possible polymer films:
    • polyethylene terephthalate (PET)
    • triacetate cellulose (TAC)
    • ethylene tetrafluoroethylene (ETFE)
    • customer-specific substrate
    • laquers on flexible substrates
Optical reflectivity before and after plasma nanostructuring treatment
Optical reflectivity before and after plasma nanostructuring treatment
Plasma nanostructured anti-reflective surface (SEM image)
Plasma nanostructured anti-reflective surface (SEM image)